The Physics and Technology of Amorphous SiO 2
Springer US
Chapter title |
Synthesis of Buried Dielectric Layers in Silicon by Ion Implantation
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Chapter number | 62 |
Book title |
The Physics and Technology of Amorphous SiO 2
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Published by |
Springer, Boston, MA, January 1988
|
DOI | 10.1007/978-1-4613-1031-0_62 |
Book ISBNs |
978-1-4612-8301-0, 978-1-4613-1031-0
|
Authors |
Ian H. Wilson, Wilson, Ian H. |
Country | Count | As % |
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Unknown | 1 | 100% |
Readers by professional status | Count | As % |
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Researcher | 1 | 100% |
Readers by discipline | Count | As % |
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Physics and Astronomy | 1 | 100% |