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The Physics and Technology of Amorphous SiO 2

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Cover of 'The Physics and Technology of Amorphous SiO 2'

Table of Contents

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    Book Overview
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    Chapter 1 Current Models for Amorphous SiO 2
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    Chapter 2 Structural Similarities and Dissimilarities Between SiO<Subscript>2</Subscript> and H<Subscript>2</Subscript>O
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    Chapter 3 Geometrical Methods in the Theory of Glassses
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    Chapter 4 Low Lying Excitations in Silica
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    Chapter 5 New Methods of IR Spectroscopic Investigation of Amorphous Insulating Films
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    Chapter 6 Vibrational Studies of Amorphous SiO 2
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    Chapter 7 Raman Spectra of SiO 2 Fibers at High Tensile Strain
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    Chapter 8 A Comparison of the Structure of a-SiO 2 Prepared by Different Routes
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    Chapter 9 NMR Studies of Neutron-Irradiated Crystalline and Vitreous Silica
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    Chapter 10 Electronic Structure of Defects in Amorphous SiO 2
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    Chapter 11 Electron and Hole Traps Related to A π-Bonded Oxygen Vacancy Center in SiO 2
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    Chapter 12 Theory of Oxygen-Vacancy Defects in Silicon Dioxide
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    Chapter 13 Total Energy Calculations for Intrinsic Defects in Amorphous SiO 2
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    Chapter 14 Boron Impurity Centers in SiO 2 a Tight Binding Consideration
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    Chapter 15 Intrinsic and Extrinsic Point Defects in a-SiO 2
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    Chapter 16 Self-Trapped Excitons in Amorphous and Crystalline SiO 2
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    Chapter 17 Identification of Native Defects in a-SiO 2
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    Chapter 18 UV and VUV Optical Absorption due to Intrinsic and Laser Induced Defects in Synthetic Silica Glasses
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    Chapter 19 Incommensurate Phase of Quartz: Microscopic Origin and Interaction with Defects
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    Chapter 20 Gamma-Ray Induced 2 eV Optical Absorption Band in Pure-Silica Core Fibers
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    Chapter 21 On the Decay of X-Ray Induced Luminescence of SiO 2
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    Chapter 22 On the Role of O 2 - in the Luminescence of Amorphous and Crystalline SiO 2
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    Chapter 23 Transformation of Radiation Induced Defect Centers as a Probe of Molecular Diffusion in a-SiO 2
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    Chapter 24 Observation of the Neutral Oxygen Vacancy in Silicon Dioxide
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    Chapter 25 New Insight Into the Structure of SiO<Subscript>2</Subscript> Glass from a Point Defect Study
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    Chapter 26 Hydrogen Bonds Between Peroxy Radicals and Hydrogen Molecules in SiO 2 Glass
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    Chapter 27 ESR Studies of Paramagnetic Defects formed in Amorphous SiO 2 by High Energy Heavy Ions
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    Chapter 28 On the Radiation Induced Coloration of SiO<Subscript>2</Subscript>
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    Chapter 29 Effects of Processing on Radiation Damage Thresholds in Silica Glasses
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    Chapter 30 The Structure of Defects in Doped SiO 2
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    Chapter 31 Electrical and Optical Characteristics of Vanadium Doped Amorphous Silicon Dioxide Films Prepared by CVD
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    Chapter 32 Theory of Dangling Orbital Defects at the &lt;111&gt; Si/SiO 2 Interface
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    Chapter 33 Structure and Hyperfine Interaction of Si<Subscript>3</Subscript>≡ Si• Defect Clusters
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    Chapter 34 On the Relationship Between Thermal Growth and Thickness Inhomogeneities in Very Thin SiO 2 Films
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    Chapter 35 The P b Center at the Si-SiO 2 Precipitate Interfaces in Buried Oxide Materials: 29 Si Hyperfine Interactions and Linewidths
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    Chapter 36 Metastabile and Multiply-Charged Individual Defects at the Si:SiO 2 Interface
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    Chapter 37 The Influence of Disorder on the Si 2p XPS Lineshape at the Si — SiO 2 Interface
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    Chapter 38 Si — SiO 2 Interfaces — a Hrtem Study
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    Chapter 39 Electrical and Interface Properties of MOS Structures of Getter Treated Silicon
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    Chapter 40 Influence of Different Preparation Methods on Interfacial (SiO 2 /Si) Parameters of Very Thin SiO 2 Layers
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    Chapter 41 Thermal Oxidation of Silicon
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    Chapter 42 A Framework for Incorporating Memory Effects of Structural Relaxation in Models for Thermal Oxidation of Silicon
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    Chapter 43 Analysis of Stress Relaxation and Growth Kinetics for Two-Step Thermal Oxidation of Silicon
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    Chapter 44 Photo-Induced Oxidation Processes in Silicon
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    Chapter 45 Growth and Structure of Argon Laser Grown SiO<Subscript>2</Subscript>
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    Chapter 46 Transport Properties of Plasma Enhanced CVD Silicon Oxynitride Films
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    Chapter 47 Characteristics of SiO<Subscript>2</Subscript> and SiO<Subscript>X</Subscript>N<Subscript>Y</Subscript>, Obtained by Rapid Thermal Processes
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    Chapter 48 Evidence for Oxygen Bubbles in Fluorine Doped Amorphous Silicon Dioxide Thin Films
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    Chapter 49 Low Temperature P.E.C.V.D. Silicon Rich Silicon Dioxide Films Doped with Fluorine
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    Chapter 50 High Field Transport in SiO 2
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    Chapter 51 Hot Electrons in SiO 2 : Ballistic and Steady-State Transport
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    Chapter 52 Electronic Charge Transport in Thin SiO 2 Films
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    Chapter 53 The Role of Hole Traps in the Degradation of Thermally Grown SiO<Subscript>2</Subscript> Layers
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    Chapter 54 The Influence of High Temperature Nitrogen Annealing on the Electrical Properties of Plasma Nitrided Oxides
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    Chapter 55 High-Field Positive-Charge Generation and its Relation to Breakdown in a-SiO 2
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    Chapter 56 Breakdown Mechanisms of Thermally Grown
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    Chapter 57 Field Dependence of Time-To-Breakdown Distribution of Thin Oxides
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    Chapter 58 Radiation Effects in MOS VLSI Structures
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    Chapter 59 Relationship Between Hole Trapping and Interface
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    Chapter 60 Radiation-Induced Conductivity of Thin Silicon Dioxide Films on Silicon
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    Chapter 61 Interface Degradation in Short-Channel MOSFETs
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    Chapter 62 Synthesis of Buried Dielectric Layers in Silicon by Ion Implantation
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    Chapter 63 Electrical Properties of Simox Material and Devices
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    Chapter 64 Formation Mechanisms and Structures of Thin Buried Layers of SiO 2 Fabricated Using Ion Beam Synthesis
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    Chapter 65 Low-Temperature ESR Study of SIMOX Structures
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    Chapter 66 Defects in Silicon-on-Insulator Structures Formed by O + Implantation: Their Dependence on Implantation Temperature
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    Chapter 67 Interface Properties and Recombination Mechanisms in Simox Structures
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    Chapter 68 Porous Silica Sol-Gel Coatings for Nd: Glass High-Power Pulsed Laser Uses
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    Chapter 69 Vacuum Re-Emission of Positrons from a-SiO 2 Layers
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Title
The Physics and Technology of Amorphous SiO 2
Published by
Springer US, December 2012
DOI 10.1007/978-1-4613-1031-0
ISBNs
978-1-4612-8301-0, 978-1-4613-1031-0
Editors

Devine, Roderick

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Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 25 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
France 1 4%
Unknown 24 96%

Demographic breakdown

Readers by professional status Count As %
Student > Master 9 36%
Student > Ph. D. Student 6 24%
Researcher 4 16%
Student > Bachelor 3 12%
Professor > Associate Professor 1 4%
Other 0 0%
Unknown 2 8%
Readers by discipline Count As %
Physics and Astronomy 8 32%
Materials Science 6 24%
Engineering 4 16%
Chemistry 2 8%
Nursing and Health Professions 1 4%
Other 1 4%
Unknown 3 12%

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