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Chapter title |
Effects of Processing on Radiation Damage Thresholds in Silica Glasses
|
---|---|
Chapter number | 29 |
Book title |
The Physics and Technology of Amorphous SiO 2
|
Published by |
Springer, Boston, MA, January 1988
|
DOI | 10.1007/978-1-4613-1031-0_29 |
Book ISBNs |
978-1-4612-8301-0, 978-1-4613-1031-0
|
Authors |
R. F. Haglund, D. L. Kinser, H. Mogul, N. H. Tolk, P. W. Wang, R. A. Weeks, Haglund, R. F., Kinser, D. L., Mogul, H., Tolk, N. H., Wang, P. W., Weeks, R. A. |