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Copper Interconnect Technology

Overview of attention for book
Attention for Chapter 6: The Copper Damascene Process and Chemical Mechanical Polishing
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Citations

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11 Mendeley
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Chapter title
The Copper Damascene Process and Chemical Mechanical Polishing
Chapter number 6
Book title
Copper Interconnect Technology
Published by
Springer, New York, NY, January 2009
DOI 10.1007/978-1-4419-0076-0_6
Book ISBNs
978-1-4419-0075-3, 978-1-4419-0076-0
Authors

Tapan Gupta

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 11 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 11 100%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 3 27%
Researcher 3 27%
Student > Postgraduate 1 9%
Student > Doctoral Student 1 9%
Unknown 3 27%
Readers by discipline Count As %
Materials Science 4 36%
Engineering 3 27%
Unknown 4 36%