↓ Skip to main content

Copper Interconnect Technology

Overview of attention for book
Attention for Chapter 5: Deposition Technologies of Materials for Cu-Interconnects
Altmetric Badge

Readers on

mendeley
3 Mendeley
You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output. Click here to find out more.
Chapter title
Deposition Technologies of Materials for Cu-Interconnects
Chapter number 5
Book title
Copper Interconnect Technology
Published by
Springer, New York, NY, January 2009
DOI 10.1007/978-1-4419-0076-0_5
Book ISBNs
978-1-4419-0075-3, 978-1-4419-0076-0
Authors

Tapan Gupta

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 3 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 3 100%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 1 33%
Researcher 1 33%
Unknown 1 33%
Readers by discipline Count As %
Materials Science 1 33%
Engineering 1 33%
Unknown 1 33%