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Chapter title |
Comparison of SiO 2 Thin Film Properties Deposited by Distributed Electron Cyclotron Resonance Plasma Using Two Different Oxidant Gases: N 2 O or O 2
|
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Chapter number | 17 |
Book title |
The Physics and Chemistry of SiO 2 and the Si-SiO 2 Interface 2
|
Published by |
Springer, Boston, MA, January 1993
|
DOI | 10.1007/978-1-4899-1588-7_17 |
Book ISBNs |
978-1-4899-1590-0, 978-1-4899-1588-7
|
Authors |
B. Agius, M. C. Hugon, N. Jiang, F. Plais, D. Pribat, T. Carriere |