You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output.
Click here to find out more.
Mendeley readers
| Chapter title |
Systematic Yield - Chemical Mechanical Polishing (CMP)
|
|---|---|
| Chapter number | 4 |
| Book title |
Design for Manufacturability and Yield for Nano-Scale CMOS
|
| Published by |
Springer, Dordrecht, January 2007
|
| DOI | 10.1007/978-1-4020-5188-3_4 |
| Book ISBNs |
978-1-4020-5187-6, 978-1-4020-5188-3
|
| Authors |
Charles C. Chiang, Jamil Kawa, Chiang, Charles C., Kawa, Jamil |
Mendeley readers
The data shown below were compiled from readership statistics for 3 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Unknown | 3 | 100% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Researcher | 2 | 67% |
| Student > Doctoral Student | 1 | 33% |
| Readers by discipline | Count | As % |
|---|---|---|
| Materials Science | 2 | 67% |
| Engineering | 1 | 33% |