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Thin Films and Heterostructures for Oxide Electronics

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Cover of 'Thin Films and Heterostructures for Oxide Electronics'

Table of Contents

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    Book Overview
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    Chapter 1 Nanoscale Phenomena in Ferroelectric Thin Films
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    Chapter 2 High- K Candidates for Use as the Gate Dielectric in Silicon Mosfets
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    Chapter 3 Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS
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    Chapter 4 Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices
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    Chapter 5 Manganite, Magnetite, and Double- Perovskite Thin Films and Heterostructures
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    Chapter 6 Diluted Magnetic Oxide Systems
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    Chapter 7 Epitaxial Growth and Properties of Magnetically Doped TiO 2
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    Chapter 8 Interfaces in Materials with Correlated Electron Systems
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    Chapter 9 Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials
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    Chapter 10 Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices
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    Chapter 11 Combinatorial Synthesis of Functional Metal Oxide Thin Films
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    Chapter 12 Real-Time Growth Monitoring by High-Pressure Rheed During Pulsed Laser Deposition
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    Chapter 13 Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition
Attention for Chapter 2: High- K Candidates for Use as the Gate Dielectric in Silicon Mosfets
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