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Mendeley readers
| Chapter title |
High- K Candidates for Use as the Gate Dielectric in Silicon Mosfets
|
|---|---|
| Chapter number | 2 |
| Book title |
Thin Films and Heterostructures for Oxide Electronics
|
| Published by |
Springer, Boston, MA, January 2005
|
| DOI | 10.1007/0-387-26089-7_2 |
| Book ISBNs |
978-0-387-25802-7, 978-0-387-26089-1
|
| Authors |
D.G. Schlom, C.A. Billman, J.H. Haeni, J. Lettieri, P.H. Tan, R.R.M. Held, S. Völk, K.J. Hubbard |
Mendeley readers
The data shown below were compiled from readership statistics for 12 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Germany | 1 | 8% |
| Unknown | 11 | 92% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Researcher | 5 | 42% |
| Student > Ph. D. Student | 4 | 33% |
| Student > Doctoral Student | 1 | 8% |
| Student > Master | 1 | 8% |
| Unknown | 1 | 8% |
| Readers by discipline | Count | As % |
|---|---|---|
| Physics and Astronomy | 5 | 42% |
| Materials Science | 5 | 42% |
| Engineering | 1 | 8% |
| Unknown | 1 | 8% |