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Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications

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Cover of 'Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications'

Table of Contents

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    Book Overview
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    Chapter 1 Introduction
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    Chapter 2 Degradation Mechanisms
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    Chapter 3 Techniques and Devices
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    Chapter 4 Negative Bias Temperature Instability in (Si)Ge pMOSFETs
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    Chapter 5 Negative Bias Temperature Instability in Nanoscale Devices
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    Chapter 6 Channel Hot Carriers and Other Reliability Mechanisms
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    Chapter 7 Conclusions and Perspectives
Attention for Chapter 5: Negative Bias Temperature Instability in Nanoscale Devices
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