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Reactive Sputter Deposition

Overview of attention for book
Attention for Chapter 1: Simulation of the Sputtering Process
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Citations

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77 Mendeley
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Chapter title
Simulation of the Sputtering Process
Chapter number 1
Book title
Reactive Sputter Deposition
Published by
Springer, Berlin, Heidelberg, January 2008
DOI 10.1007/978-3-540-76664-3_1
Book ISBNs
978-3-54-076662-9, 978-3-54-076664-3
Authors

Tadayoshi Ono, Takahiro Kenmotsu, Tetsuya Muramoto

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 77 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Belgium 2 3%
Germany 1 1%
Colombia 1 1%
Norway 1 1%
Netherlands 1 1%
Unknown 71 92%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 19 25%
Researcher 12 16%
Student > Master 11 14%
Student > Bachelor 8 10%
Student > Doctoral Student 6 8%
Other 13 17%
Unknown 8 10%
Readers by discipline Count As %
Materials Science 29 38%
Physics and Astronomy 16 21%
Engineering 13 17%
Chemistry 2 3%
Business, Management and Accounting 1 1%
Other 2 3%
Unknown 14 18%