Chapter 1 Non-Silicon MOSFET Technology: A Long Time Coming

Chapter 2 Properties and Trade-Offs of Compound Semiconductor MOSFETs

Chapter 3 Device Physics and Performance Potential of III-V Field-Effect Transistors

Chapter 4 Theory of HfO 2 -Based High-k Dielectric Gate Stacks

Chapter 5 Density Functional Theory Simulations of High-k Oxides on III-V Semiconductors

Chapter 6 Interfacial Chemistry of Oxides on III-V Compound Semiconductors

Chapter 7 Atomic-Layer Deposited High-k/III-V Metal-Oxide-Semiconductor Devices and Correlated Empirical Model

Chapter 8 Materials and Technologies for III-V MOSFETs

Chapter 9 InGaAs, Ge, and GaN Metal-Oxide-Semiconductor Devices with High-k Dielectrics for Science and Technology Beyond Si CMOS

Chapter 10 Sub-100 nm Gate III-V MOSFET for Digital Applications

Chapter 11 Electrical and Material Characteristics of Hafnium Oxide with Silicon Interface Passivation on III-V Substrate for Future Scaled CMOS Technology

Chapter 12 p-type Channel Field-Effect Transistors

Chapter 13 Insulated Gate Nitride-Based Field Effect Transistors

Chapter 14 Technology/Circuit Co-Design for III-V FETs