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Chemical-Mechanical Planarization of Semiconductor Materials

Overview of attention for book
Attention for Chapter 7: Fundamentals of CMP Slurry
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Citations

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4 Mendeley
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Chapter title
Fundamentals of CMP Slurry
Chapter number 7
Book title
Chemical-Mechanical Planarization of Semiconductor Materials
Published by
Springer, Berlin, Heidelberg, January 2004
DOI 10.1007/978-3-662-06234-0_7
Book ISBNs
978-3-64-207738-8, 978-3-66-206234-0
Authors

Karl Robinson, Robinson, Karl

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 4 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 4 100%

Demographic breakdown

Readers by professional status Count As %
Researcher 2 50%
Student > Master 1 25%
Unknown 1 25%
Readers by discipline Count As %
Chemistry 2 50%
Materials Science 1 25%
Unknown 1 25%