You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output.
Click here to find out more.
Chapter title |
Reactive Ion Etching of Silicon Carbide with Fluorine-Containing Plasmas
|
---|---|
Chapter number | 43 |
Book title |
Wide Band Gap Electronic Materials
|
Published by |
Springer, Dordrecht, January 1995
|
DOI | 10.1007/978-94-011-0173-8_43 |
Book ISBNs |
978-9-40-104078-5, 978-9-40-110173-8
|
Authors |
V. E. Sizov, K. V. Vassilevski |