Emerging Technologies for In Situ Processing

Table of Contents

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   Book Overview
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   Chapter 1 In-Situ Processing Combining MBE, Lithography and Ion Implantation
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   Chapter 2 Motivations and Early Demonstrations for In-Situ Processings for III — V Semiconductor Devices
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   Chapter 3 Laser Etching and Microelectronic Applications
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   Chapter 4 Laser-Induced Chemical Processing of Materials
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   Chapter 5 High Technology Manufacturing: Critical Issues for the Future
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   Chapter 6 Ultra High Vacuum Processing: MBE
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   Chapter 7 Epitaxial Growth of III-V Materials on Implanted III-V Substrates
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   Chapter 8 Mechanisms of Laser-Induced Deposition from the Gas Phase
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    Chapter 9 Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition Of Platinum
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    Chapter 10 Excimer Laser Projection Patterning
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    Chapter 11 Excimer Laser Patterning And Etching Of Metals
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    Chapter 12 Ion Projection Lithography
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    Chapter 13 UV Light-Assisted Deposition of Al on Si from TMA
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    Chapter 14 E-Beam Induced Decomposition of Inorganic Solids
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    Chapter 15 Electronic Connection Through Silicon Wafers
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    Chapter 16 The Development and use of Novel Precursors for Photolytic Deposition of Dielectric Films
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    Chapter 17 Focused Ion Beam Induced Deposition
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    Chapter 18 Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks
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    Chapter 19 Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation
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    Chapter 20 Focused Ion Beam Technology and Applications
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    Chapter 21 Laser Direct Writing for Device Applications
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    Chapter 22 Laser-Induced Photoetching of Semiconductors with Chlorine
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    Chapter 23 Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication
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    Chapter 24 Synthesis and Characterization of Laser Driven Powders
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    Chapter 25 Physical Properties of Laser Written Chromium Oxide Thin Films
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    Chapter 26 Uv Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime
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    Chapter 27 Laser Assisted Plasma Etching Of Silicon Dioxide
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    Chapter 28 Nd: YAG Laser Processing for Circuit Modification and Direct Writing of Silicon Conductors
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    Chapter 29 Study of Excimer Laser Enhanced Etching of Copper and Silicon with (Sub) Monolayer Coverages of Chlorine
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    Chapter 30 Surface Chemical Probes and their Application to the Study of in Situ Semiconductor Processing