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Ion Implantation and Synthesis of Materials

Overview of attention for book
Ion Implantation and Synthesis of Materials
Springer-Verlag Berlin Heidelberg

Table of Contents

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    Book Overview
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    Chapter 1 General Features and Fundamental Concepts
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    Chapter 2 Particle Interactions
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    Chapter 3 Dynamics of Binary Elastic Collisions
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    Chapter 4 Cross-Section
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    Chapter 5 Ion Stopping
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    Chapter 6 Ion Range and Range Distribution
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    Chapter 7 Displacements and Radiation Damage
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    Chapter 8 Channeling
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    Chapter 9 Doping, Diffusion and Defects in Ion-Implanted Si
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    Chapter 10 Crystallization and Regrowth of Amorphous Si
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    Chapter 11 Si Slicing and Layer Transfer: Ion-Cut
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    Chapter 12 Surface Erosion During Implantation: Sputtering
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    Chapter 13 Ion-Induced Atomic Intermixing at the Interface: Ion Beam Mixing
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    Chapter 14 Application of Ion Implantation Techniques in CMOS Fabrication
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    Chapter 15 Ion implantation in CMOS Technology: Machine Challenges
Attention for Chapter 8: Channeling
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Chapter title
Channeling
Chapter number 8
Book title
Ion Implantation and Synthesis of Materials
Published by
Springer, Berlin, Heidelberg, January 2006
DOI 10.1007/978-3-540-45298-0_8
Book ISBNs
978-3-54-023674-0, 978-3-54-045298-0
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