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Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition

Overview of attention for article published in Discover Nano, May 2019
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Title
Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition
Published in
Discover Nano, May 2019
DOI 10.1186/s11671-019-3028-5
Pubmed ID
Authors

Hongyan Xu, Feng Han, Chengkai Xia, Siyan Wang, Ranjith K. Ramachandran, Christophe Detavernier, Minsong Wei, Liwei Lin, Serge Zhuiykov

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 2 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 2 100%

Demographic breakdown

Readers by professional status Count As %
Professor > Associate Professor 1 50%
Student > Doctoral Student 1 50%
Readers by discipline Count As %
Materials Science 1 50%
Engineering 1 50%