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Maskless Single-Sided Wet Etching Process for the Fabrication of Ultra-Low Distortion Polyimide Membranes

Overview of attention for article published in MRS Advances, February 2011
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Title
Maskless Single-Sided Wet Etching Process for the Fabrication of Ultra-Low Distortion Polyimide Membranes
Published in
MRS Advances, February 2011
DOI 10.1557/proc-356-615
Authors

M. L. Schattenburg, R. I. Fuentes, G. Czernienko, R. C. Fleming, J. Porter

Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 3. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 11 September 2019.
All research outputs
#8,537,346
of 25,377,790 outputs
Outputs from MRS Advances
#128
of 903 outputs
Outputs of similar age
#44,036
of 119,718 outputs
Outputs of similar age from MRS Advances
#55
of 469 outputs
Altmetric has tracked 25,377,790 research outputs across all sources so far. This one is in the 43rd percentile – i.e., 43% of other outputs scored the same or lower than it.
So far Altmetric has tracked 903 research outputs from this source. They receive a mean Attention Score of 3.2. This one is in the 38th percentile – i.e., 38% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 119,718 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 25th percentile – i.e., 25% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 469 others from the same source and published within six weeks on either side of this one. This one is in the 22nd percentile – i.e., 22% of its contemporaries scored the same or lower than it.