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Mendeley readers
| Title |
Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors
|
|---|---|
| Published in |
Discover Nano, February 2017
|
| DOI | 10.1186/s11671-017-1908-0 |
| Pubmed ID | |
| Authors |
Guilei Wang, Jun Luo, Changliang Qin, Renrong Liang, Yefeng Xu, Jinbiao Liu, Junfeng Li, Huaxiang Yin, Jiang Yan, Huilong Zhu, Jun Xu, Chao Zhao, Henry H. Radamson, Tianchun Ye |
Mendeley readers
The data shown below were compiled from readership statistics for 13 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Unknown | 13 | 100% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Student > Master | 3 | 23% |
| Professor | 2 | 15% |
| Student > Doctoral Student | 1 | 8% |
| Student > Ph. D. Student | 1 | 8% |
| Student > Bachelor | 1 | 8% |
| Other | 2 | 15% |
| Unknown | 3 | 23% |
| Readers by discipline | Count | As % |
|---|---|---|
| Engineering | 6 | 46% |
| Materials Science | 3 | 23% |
| Physics and Astronomy | 1 | 8% |
| Unknown | 3 | 23% |