Review and perspective on ferroelectric HfO2-based thin films for memory applications

Overview of attention for article published in MRS Communications, August 2018

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In the top 25% of all research outputs scored by Altmetric
Among the highest-scoring outputs from this source (#39 of 224)
Good Attention Score compared to outputs of the same age (73rd percentile)
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RT @TMikolajick: Review and perspective on ferroelectric HfO2-based thin films for memory applications https://t.co/SUOQskwXd9

RT @TMikolajick: Review and perspective on ferroelectric HfO2-based thin films for memory applications https://t.co/SUOQskwXd9

RT @TMikolajick: Review and perspective on ferroelectric HfO2-based thin films for memory applications https://t.co/SUOQskwXd9

RT @TMikolajick: Review and perspective on ferroelectric HfO2-based thin films for memory applications https://t.co/SUOQskwXd9

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