Ion Implantation: Equipment and Techniques
Springer Berlin Heidelberg
Chapter title |
CO 2 Laser Annealing of Ion-Implanted Silicon: Relaxation Characteristics of Metastable Concentrations
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Chapter number | 58 |
Book title |
Ion Implantation: Equipment and Techniques
|
Published by |
Springer, Berlin, Heidelberg, January 1983
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DOI | 10.1007/978-3-642-69156-0_58 |
Book ISBNs |
978-3-64-269158-4, 978-3-64-269156-0
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Authors |
J. Götzlich, P. H. Tsien, G. Henghuber, H. Ryssel, Götzlich, J., Tsien, P. H., Henghuber, G., Ryssel, H. |