Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices

Table of Contents

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   Book Overview
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   Chapter 1 Plasma Sputter Deposition Systems: Plasma Generation, Basic Physics and Characterization
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   Chapter 2 Technology and Application of Filamentless RF — Ion Sources in Ion Beam Sputter Deposition
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   Chapter 3 Physics of Film Growth from the Vapor Phase
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   Chapter 4 Techniques for the Growth of Crystalline Films by Molecular Beam Deposition
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   Chapter 5 Discharge Density Increase for High Rate Magnetron Sputtering
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   Chapter 6 On the Transport of Sputtered Species in Plasma Sputter-Deposition Systems
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   Chapter 7 Influence of Sputter Gas Pressure and Substrate Bias on Intrinsic Stress and Crystallinity of Coatings Produced by Magnetron Sputtering
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   Chapter 8 Sputter Deposition of Multicomponent Targets: What Parts of the Process Affect the Elemental Composition of the Film
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    Chapter 9 A Proposition of a Novel Reactive Sputter-Deposition System for Synthesizing Multi-Component Materials
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    Chapter 10 The Influence of Precursors on the Preparation of Thin Pyrite Films by Metal Organic Chemical Vapor Deposition
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    Chapter 11 Modelling of the Intrinsic Stress in PVD-Coatings
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    Chapter 12 Physical Vapor Deposition of Multicomponent Oxide Thin Films: Techniques, Basic Deposition Processes and Film Processing-Microstructure-Property Relationships
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    Chapter 13 Pulsed Laser Deposited Metal-Oxide Based Superconductor, Semiconductor and Dielectric Heterostructures and Superlattices
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    Chapter 14 Synthesis of Optical Thin Films: Fundamentals and Applications
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    Chapter 15 Ion Beam-Based Characterization of Multicomponent Oxide Thin Films and Thin Film Layered Structures
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    Chapter 16 Electron Spectroscopic Analysis of Multicomponent Thin Films with Particular Emphasis on Oxides
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    Chapter 17 Transmission Electron Microscopy of Oxide Thin Films
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    Chapter 18 Laser Deposition of HTSC Films: Expansion of the Laser Plasma, Deposition of Particles, Formation of the Crystal Structure and Superconducting Properties of Films
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    Chapter 19 YBaCuO Films by Pulsed Laser Deposition and Sputtering
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    Chapter 20 Transverse Electrooptic Properties of Magnetron Sputtered PLZT Thin Films
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    Chapter 21 Lead Zirconate Titanate Ferroelectric Thin Films by Laser Ablation Deposition
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    Chapter 22 Photo Voltaic Properties of Reactive Thermal Evaporated Indium Oxide (IO)/ Silicon Junctions
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    Chapter 23 In Situ Compositional Analysis of Multielement Thin Films
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    Chapter 24 Si-Ge Strained Layer Heterostructures: Device Possibilities and Process Limitations
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    Chapter 25 Growth, Properties and Applications of Epitaxial Silicides
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    Chapter 26 Deposition Fundamentals and Properties of Metallic and Diffusion Barrier Films
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    Chapter 27 Epitaxial CoSi 2 Formation on (001) Si Using Sequentially Deposited Ti-Co Bilayers
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    Chapter 28 Stress in Si 1-x Ge x Films Prepared by Ion Beam Sputtering
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    Chapter 29 Band Engineering of High Bandgap Semiconductors by Superlattices
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    Chapter 30 Characterization of Tungsten Films and Hard Tungsten-Carbon Coatings Prepared by DC Magnetron Sputtering Process
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    Chapter 31 Pulsed Excimer Laser Induced Reactions at the Tungsten-Silicon Interface
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    Chapter 32 Rapid Pulsed CO 2 — Laser Annealing of Silicon-Nitride / Silicon Interface States
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    Chapter 33 Interface Properties of Anodic Sulfide and Sulfide-Oxide Films on n-InSb
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    Chapter 34 Spin Glass Like Behavior in Cr-Cu Multilayers
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    Chapter 35 High Temperature Superconducting Thin Film-Based Devices
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    Chapter 36 Ferroelectric Thin Films and Device Applications
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    Chapter 37 Phase Locking in Series-Connected Nb-Al-Nb Planar Josephson Weak Links