Ion Implantation: Equipment and Techniques
Springer Berlin Heidelberg
Chapter title |
A Rotating Attenuator for Concentration Profiling of Implanted Helium Ions
|
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Chapter number | 28 |
Book title |
Ion Implantation: Equipment and Techniques
|
Published by |
Springer, Berlin, Heidelberg, January 1983
|
DOI | 10.1007/978-3-642-69156-0_28 |
Book ISBNs |
978-3-64-269158-4, 978-3-64-269156-0
|
Authors |
J. H. Chang, W. J. Choyke, N. J. Doyle, Chang, J. H., Choyke, W. J., Doyle, N. J. |