Ion Implantation: Equipment and Techniques
Springer Berlin Heidelberg
Chapter title |
Channeling and High-Resolution Backscattering Studies of Laser-Annealed Low-Energy Arsenic-Implanted Silicon
|
---|---|
Chapter number | 63 |
Book title |
Ion Implantation: Equipment and Techniques
|
Published by |
Springer, Berlin, Heidelberg, January 1983
|
DOI | 10.1007/978-3-642-69156-0_63 |
Book ISBNs |
978-3-64-269158-4, 978-3-64-269156-0
|
Authors |
P. J. Scanlon, K. M. Barfoot, P. Skensved, J. L. Whitton, I. D. Calder, F. R. Shepherd, Scanlon, P. J., Barfoot, K. M., Skensved, P., Whitton, J. L., Calder, I. D., Shepherd, F. R. |