You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output.
Click here to find out more.
Chapter title |
An Integrated Plasma Equipment — Feature Evolution Model for Thin Film Etching Applications
|
---|---|
Chapter number | 14 |
Book title |
Gaseous Dielectrics IX
|
Published by |
Springer, Boston, MA, January 2001
|
DOI | 10.1007/978-1-4615-0583-9_14 |
Book ISBNs |
978-1-4613-5143-6, 978-1-4615-0583-9
|
Authors |
Shahid Rauf, Da Zhang, Peter L. G. Ventzek, Rauf, Shahid, Zhang, Da, Ventzek, Peter L. G. |