You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output.
Click here to find out more.
Mendeley readers
| Chapter title |
Photomask Etching
|
|---|---|
| Chapter number | 9 |
| Book title |
Handbook of Advanced Plasma Processing Techniques
|
| Published by |
Springer, Berlin, Heidelberg, January 2000
|
| DOI | 10.1007/978-3-642-56989-0_9 |
| Book ISBNs |
978-3-64-263096-5, 978-3-64-256989-0
|
| Authors |
D. J. Resnick |
Mendeley readers
The data shown below were compiled from readership statistics for 5 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Unknown | 5 | 100% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Researcher | 2 | 40% |
| Student > Ph. D. Student | 1 | 20% |
| Student > Master | 1 | 20% |
| Unknown | 1 | 20% |
| Readers by discipline | Count | As % |
|---|---|---|
| Physics and Astronomy | 1 | 20% |
| Engineering | 1 | 20% |
| Unknown | 3 | 60% |