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Mendeley readers
| Title |
Beneficial defects: exploiting the intrinsic polishing-induced wafer roughness for the catalyst-free growth of Ge in-plane nanowires
|
|---|---|
| Published in |
Discover Nano, July 2014
|
| DOI | 10.1186/1556-276x-9-358 |
| Pubmed ID | |
| Authors |
Luca Persichetti, Anna Sgarlata, Stefano Mori, Marco Notarianni, Valeria Cherubini, Massimo Fanfoni, Nunzio Motta, Adalberto Balzarotti |
Mendeley readers
The data shown below were compiled from readership statistics for 13 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Unknown | 13 | 100% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Professor | 4 | 31% |
| Student > Postgraduate | 2 | 15% |
| Researcher | 2 | 15% |
| Student > Doctoral Student | 1 | 8% |
| Student > Ph. D. Student | 1 | 8% |
| Other | 0 | 0% |
| Unknown | 3 | 23% |
| Readers by discipline | Count | As % |
|---|---|---|
| Materials Science | 4 | 31% |
| Physics and Astronomy | 3 | 23% |
| Engineering | 2 | 15% |
| Unknown | 4 | 31% |