Title |
Multilayer porous silicon diffraction gratings operating in the infrared
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Published in |
Discover Nano, November 2012
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DOI | 10.1186/1556-276x-7-645 |
Pubmed ID | |
Authors |
Meifang Lai, Gayathri M Sridharan, Giacinta Parish, Shanti Bhattacharya, Adrian Keating |
Abstract |
Transmission diffraction gratings operating at 1,565 nm based on multilayer porous silicon films are modeled, fabricated, and tested. Features down to 2 μm have been patterned into submicron-thick mesoporous films using standard photolithographic and dry etching techniques. After patterning of the top porous film, a second anodization can be performed, allowing an under-layer of highly uniform porosity and thickness to be achieved. High transmission greater than 40% is measured, and modeling results suggest that a change in diffraction efficiency of 1 dB for a 1% change in normalized refractive index can be achieved. Preliminary measurement of solvent vapor shows a large signal change from the grating sensor in agreement with models. |
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