↓ Skip to main content

Dislocation reduction of InAs nanofins prepared on Si substrate using metal-organic vapor-phase epitaxy

Overview of attention for article published in Discover Nano, November 2012
Altmetric Badge

Mentioned by

facebook
1 Facebook page

Citations

dimensions_citation
8 Dimensions

Readers on

mendeley
9 Mendeley
You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output. Click here to find out more.
Title
Dislocation reduction of InAs nanofins prepared on Si substrate using metal-organic vapor-phase epitaxy
Published in
Discover Nano, November 2012
DOI 10.1186/1556-276x-7-642
Pubmed ID
Authors

Chao-Wei Hsu, Yung-Feng Chen, Yan-Kuin Su

Abstract

InAs nanofins were prepared on a nanopatterned Si (001) substrate by metal-organic vapor-phase epitaxy. The threading dislocations, stacked on the lowest-energy-facet plane {111}, move along the SiO2 walls, resulting in a dislocation reduction, as confirmed by transmission electron microscopy. The dislocations were trapped within a thin InAs epilayer. The obtained 90-nm-wide InAs nanofins with an almost etching-pit-free surface do not require complex intermediate-layer epitaxial growth processes and large thickness typically required for conventional epitaxial growth.

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 9 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 9 100%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 5 56%
Other 1 11%
Student > Doctoral Student 1 11%
Student > Master 1 11%
Unknown 1 11%
Readers by discipline Count As %
Physics and Astronomy 4 44%
Materials Science 2 22%
Veterinary Science and Veterinary Medicine 1 11%
Engineering 1 11%
Unknown 1 11%
Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 1. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 23 November 2012.
All research outputs
#22,759,802
of 25,374,917 outputs
Outputs from Discover Nano
#798
of 1,146 outputs
Outputs of similar age
#255,426
of 285,449 outputs
Outputs of similar age from Discover Nano
#15
of 96 outputs
Altmetric has tracked 25,374,917 research outputs across all sources so far. This one is in the 1st percentile – i.e., 1% of other outputs scored the same or lower than it.
So far Altmetric has tracked 1,146 research outputs from this source. They receive a mean Attention Score of 3.5. This one is in the 1st percentile – i.e., 1% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 285,449 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 1st percentile – i.e., 1% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 96 others from the same source and published within six weeks on either side of this one. This one is in the 1st percentile – i.e., 1% of its contemporaries scored the same or lower than it.