A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars

Overview of attention for article published in Discover Nano, March 2008

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In the top 25% of all research outputs scored by Altmetric
Among the highest-scoring outputs from this source (#34 of 1,146)
High Attention Score compared to outputs of the same age (92nd percentile)

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patent: 3 patents

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W.Wu

OAtube Nanotechnology, 06 Sep 2008

Fabrication of large area periodic nanostructures using Nanosphere PhotolithographyWei Wu, Dibyendu Dey, Alex Katsnelson, Omer G.

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